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Zvikamu zveCeramic zveSemiconductor Probe Equipment
Zvigadzirwa nekupisa kunotonhora uye kunopiswa nekupisa kwakanyanya, zvobva zvagadzirwa nemachina chaiwo uye zvakapetwa, zvikamu zveceramic zvinogona kusangana nechero zvinodiwa zvemidziyo yesemiconductor ine hunhu hwayo hwekudzivirira kupera, kuramba ngura, kuwedzera kupisa kushoma, uye kuputira. Ceramics inogona kushanda mumhando dzakasiyana dzemidziyo yekugadzira semiconductor ine mamiriro ekupisa kwakanyanya, vacuum kana corrosive gas kwenguva yakareba.
Yakagadzirwa nehupfu hwealumina hwakachena kwazvo, hwakagadziriswa nekudzvanywa kwe isostatic inotonhora, kupisa kwakanyanya uye kupedzisa nemazvo, inogona kusvika pakukwanisa kwayo kusvika ±0.001 mm, kupedzisa pamusoro peRa 0.1, kuramba kupisa kusvika 1600℃.
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Ceramic Plate Semiconductor Equipment Carrier
Zvigadzirwa nekupisa kunotonhora uye kunopiswa nekupisa kwakanyanya, zvobva zvagadzirwa nemachina chaiwo uye zvakapetwa, zvikamu zveceramic zvinogona kusangana nechero zvinodiwa zvemidziyo yesemiconductor ine hunhu hwayo hwekudzivirira kupera, kuramba ngura, kuwedzera kupisa kushoma, uye kuputira. Ceramics inogona kushanda mumhando dzakasiyana dzemidziyo yekugadzira semiconductor ine mamiriro ekupisa kwakanyanya, vacuum kana corrosive gas kwenguva yakareba.
Yakagadzirwa nehupfu hwealumina hwakachena kwazvo, hwakagadziriswa nekudzvanywa kwe isostatic inotonhora, kupisa kwakanyanya uye kupedzisa nemazvo, inogona kusvika pakukwanisa kwayo kusvika ±0.001 mm, kupedzisa pamusoro peRa 0.1, kuramba kupisa kusvika 1600℃.
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Zvishandiso zveSemiconductor Ceramic Spare Parts
Zvigadzirwa nekupisa kunotonhora uye kunopiswa nekupisa kwakanyanya, zvobva zvagadzirwa nemachina chaiwo uye zvakapetwa, zvikamu zveceramic zvinogona kusangana nechero zvinodiwa zvemidziyo yesemiconductor ine hunhu hwayo hwekudzivirira kupera, kuramba ngura, kuwedzera kupisa kushoma, uye kuputira. Ceramics inogona kushanda mumhando dzakasiyana dzemidziyo yekugadzira semiconductor ine mamiriro ekupisa kwakanyanya, vacuum kana corrosive gas kwenguva yakareba.
Yakagadzirwa nehupfu hwealumina hwakachena kwazvo, hwakagadziriswa nekudzvanywa kwe isostatic inotonhora, kupisa kwakanyanya uye kupedzisa nemazvo, inogona kusvika pakukwanisa kwayo kusvika ±0.001 mm, kupedzisa pamusoro peRa 0.1, kuramba kupisa kusvika 1600℃.
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Mhete yeSeal Alumina Ceramic Yakachena Kwazvo Yekuisirwa Kwemukamuri Yekupisa Kwakakwirira
Mhete yeSt.Cera's ceramic seal yakagadzirwa senzira yekuchinja maO-rings epolymer munzvimbo dzakanyanya uko elastomers dzinoora. Yakagadzirwa kubva ku99.8% high-purity alumina (Al₂O₃), iyi mhete yakasimba inoshandiswa mukushandiswa kwe static sealing - inowanzo batanidzwa ne soft metal kana graphite gasket - kupa vacuum yakavimbika kana gasi rekudzivirira patembiricha inosvika 800°C uye munzvimbo dzine plasma kana makemikari akasimba. Chinhu ichi hachibudisi mweya, simba rekumanikidza rakawanda (simba re flexural 361 MPa), uye kusagadzikana kwemakemikari (kunodzivirira ma halogen, acids, uye alkalis kunze kweHF). Nzvimbo dzekuvhara dzakanyatsorongeka (flatness ≤5 μm, surface roughness Ra ≤0.2 μm) dzinoita kuti pave nekusangana kwakasimba kwesimbi kana ceramic components.
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Mhete yeAlumina Chamber Focus Ring yePlasma Etch & CVD Systems
Mhete yeSt.Cera's chamber focus chinhu chakakosha chinoshandiswa mumidziyo yeplasma etch, CVD, uye PVD semiconductor. Yakagadzirwa kubva ku99.8% high-purity alumina (Al₂O₃), mhete iyi inotenderedza mupendero wewafer kuti ivhare plasma uye iwedzere kugoverwa kweion angular, nokudaro ichivandudza kufanana kwe etch pamusoro pewafer. Chinhu ichi chinopa resistance yeplasma inoshamisa, simba re dielectric rakawanda (15×10⁶ V/m), uye kugadzikana kwekupisa kusvika ku1600°C, zvichiita kuti ive yakavimbika kwenguva refu munzvimbo dzeplasma dzine fluorine- kana chlorine. Precision-ground ID/OD uye flatness (≤10 μm) zvinogonesa nzvimbo chaiyo yewafer edge, kuderedza zvikanganiso zvemupendero uye kugadzirwa kwezvikamu.
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Mhete yeAlumina Ceramic Yakachena Kwazvo yeCVD / PVD Process Chambers
Mhete yeSt.Cera yakagadzirwa zvakananga kuti ishandiswe mumakamuri ekugadzirisa eCVD (Chemical Vapor Deposition) uye PVD (Physical Vapor Deposition). Yakagadzirwa kubva ku99.8% high-purity alumina (Al₂O₃), mhete iyi inoshanda sechikamu chekamuri, ring yekutarisa, kana chikamu che process kit chekuvhara plasma nekudzivirira madziro ekamuri kubva mukukukurwa. Chinhu ichi chinopa resistance yakanaka yeplasma, simba re dielectric rakawanda (15×10⁶ V/m), uye kugadzikana kwekupisa kusvika 1600°C, zvichiita kuti ive nehupenyu hurefu munzvimbo dzeplasma dzine fluorine. Kushivirira kwakaringana (±0.05 mm paID/OD) uye flatness (≤10 μm) zvinogonesa kugadzika kwewafer edge nguva dzose, kuvandudza kufanana kwekuisa uye kuderedza kugadzirwa kwezvikamu.
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Bernoulli Ceramic End Effector — Kubata Wafer Isina Kubata MaWafer Akatetepa Uye Asina Kusimba
St.Cera's Bernoulli ceramic end effector inoshandisa aerodynamic lift kubata mawafers pasina kubata muviri. Yakagadzirwa kubva ku99.8% alumina (Al₂O₃) kana silicon carbide (SiC), ine ma nozzles akagadzirwa nemazvo anoburitsa gasi rakamanikidzwa kuti rigadzire firimu remhepo rakatetepa pakati pe effector newafer. Iyi nheyo yekusabata inobvisa kusvibiswa kwemashure, kupwanyika kwemucheto, uye kukuvara kwenzvimbo, zvichiita kuti ive yakakodzera mawafers matete (≤100 μm), asina kusimba, kana akakombama. Iyo ceramic substrate inopa simba rakasimba reflexural (361 MPa yeAl₂O₃; kusvika 550–600 MPa yeSiC), huremu hwakaderera, uye kugadzikana kwakanaka, zvichiita kuti ive nechokwadi chekuti inogona kudzokororwa munzvimbo dzinoshandiswa mawafers ekumhanya kwepamusoro.
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Zvikamu zveAlumina Ceramic Zvakachena Zvakanyanya zveSemiconductor & Industrial Applications
St.Cera inogadzira zvikamu zveceramic zvakagadzirwa nemazvo (Al₂O₃) zvichienderana nezvinodiwa nevatengi. Ichishandisa 99.8% high-purity alumina, zvikamu izvi zvinopa simba rakanaka rekuchinjika (361 MPa), kuomarara kwakanyanya (16 GPa), uye simba guru re dielectric (15×10⁶ V/m). Yakagadzirirwa michina ye semiconductor, ma assemblies asingaparare, ma insulators emagetsi, uye ma fixtures ekupisa kwakanyanya, chinhu ichi chinopa kunyudzwa kwemvura kunenge kusingasvike zero (0%) uye thermal expansion coefficient ye7.2×10⁻⁶/℃, zvichiita kuti pave nekugadzikana mumamiriro ezvinhu akaoma.
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Porous Ceramic Vacuum Chuck yeWarped Wafer Handling
Chigadziko cheSt.Cera chine maburi chakagadzirwa nealumina ine maburi akaenzana e30–45% uye maburi ane maburi anokura kubva pa10 kusvika 100 μm. Kusiyana nemaburi ekare ane maburi, pamusoro pemaburi pane maburi pane wafer yese, zvichibata zvakanaka mawafer akakombama, akatetepa, kana asina kuputsika. Chigadziko ichi chine maburi chinodzivirirawo maburi ekumashure.
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Alumina-Based Porous Ceramic Vacuum Chuck yekubata Wafer yakatetepa
Chigadziko cheSt.Cera chine maburi chakagadzirwa nealumina chakagadzirwa ne99.6% Al₂O₃ ine maburi akavhurika anodzora e30–45% uye saizi yemaburi akafanana inotangira pa10 kusvika 50 μm. Kusiyana nemaburi ane maburi, nzvimbo ine maburi inopa vacuum yakapararira kuseri kwewafer yese, ichibvisa kunyorwa kwemucheto uye ichibvumira kubata zvinyoro nyoro mawafer akatetepa (≤100 μm) kana akakombama. Chigadziko ichi chinopa simba rekuchinjika ≥250 MPa uye kugadzikana kwekupisa kusvika 400°C mumhepo.
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Purati Yekugovera Gasi reAlumina yeCVD/PVD Showerhead
Purati yekugovera gasi yeSt.Cera (showerhead) yakagadzirwa nemazvo kubva mu 99.8% alumina ceramic. Ine maburi madiki (diameter 0.3–1.5 mm) ayo anovimbisa kuti gasi rinoyerera zvakaenzana pamusoro pewafer panguva yeCVD, PVD, kana ALD. Simba guru re dielectric plate (>15×10⁶ V/m) uye resistance yeplasma zvinoita kuti ive yakakosha pakuiswa kwe semiconductor thin-film.
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Pini Inotsigira Ceramic yeSemiconductor Process Fixtures
Mapini ekutsigira eSt.Cera's ceramic (anozivikanwawo semapini ekusimudza kana mapini ekutsigira) anoshandiswa mumakamuri ekugadzirisa e semiconductor kukwidziridza mawafer kana substrates panguva yekubata, kupisa, kana kutonhodza. Akagadzirwa kubva ku99.8% alumina kana silicon nitride, mapini aya anopa simba rekudzvanya, kugadzikana kwekupisa, uye kuramba makemikari. Dhizaini ye hemispherical kana flat tip inodzivirira wafer kukwenya.
