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Mhete yeAlumina Ceramic Yakachena Kwazvo yeCVD / PVD Process Chambers

Mhete yeAlumina Ceramic Yakachena Kwazvo yeCVD / PVD Process Chambers

Tsananguro pfupi:

Mhete yeSt.Cera yakagadzirwa zvakananga kuti ishandiswe mumakamuri ekugadzirisa eCVD (Chemical Vapor Deposition) uye PVD (Physical Vapor Deposition). Yakagadzirwa kubva ku99.8% high-purity alumina (Al₂O₃), mhete iyi inoshanda sechikamu chekamuri, ring yekutarisa, kana chikamu che process kit chekuvhara plasma nekudzivirira madziro ekamuri kubva mukukukurwa. Chinhu ichi chinopa resistance yakanaka yeplasma, simba re dielectric rakawanda (15×10⁶ V/m), uye kugadzikana kwekupisa kusvika 1600°C, zvichiita kuti ive nehupenyu hurefu munzvimbo dzeplasma dzine fluorine. Kushivirira kwakaringana (±0.05 mm paID/OD) uye flatness (≤10 μm) zvinogonesa kugadzika kwewafer edge nguva dzose, kuvandudza kufanana kwekuisa uye kuderedza kugadzirwa kwezvikamu.


Ruzivo rweChigadzirwa

Matagi eChigadzirwa

Mhete yeSt.Cera yakagadzirwa zvakananga kuti ishandiswe mumakamuri ekugadzirisa eCVD (Chemical Vapor Deposition) uye PVD (Physical Vapor Deposition). Yakagadzirwa kubva ku99.8% high-purity alumina (Al₂O₃), mhete iyi inoshanda sechikamu chekamuri, ring yekutarisa, kana chikamu che process kit chekuvhara plasma nekudzivirira madziro ekamuri kubva mukukukurwa. Chinhu ichi chinopa resistance yakanaka yeplasma, simba re dielectric rakawanda (15×10⁶ V/m), uye kugadzikana kwekupisa kusvika 1600°C, zvichiita kuti ive nehupenyu hurefu munzvimbo dzeplasma dzine fluorine. Kushivirira kwakaringana (±0.05 mm paID/OD) uye flatness (≤10 μm) zvinogonesa kugadzika kwewafer edge nguva dzose, kuvandudza kufanana kwekuisa uye kuderedza kugadzirwa kwezvikamu.

 

Magadzirirwo (akavakirwa pa99.8% Al₂O₃):

Pfuma Kukosha
Zvinhu 99.8% Alumina (Nyanga dzenzou)
Kuwanda kwevanhu 3.93 g/cm³
Kunyudzwa kweMvura 0%
Simba reKuchinjika 361 MPa
Kusimba Kwekutyoka 3–4 MPa·m¹/²
Kuomarara kwaVickers 16 GPa
Modulus yeYoung 380 GPa
Kufambisa kwekupisa 32 W/m·k
Kuwedzera kwekupisa (25–1000°C) 7.2×10⁻⁶/℃
Simba reDielectric 15×10⁶ V/m
Kuramba Kwakananga >10¹⁴ Ω·cm
Kupisa Kunoshanda Kwakanyanya 1600°C

 

Mashandisirwo:

  • · Mhete dzeCVD chamber focus uye mhete dzemucheto
  • · Mhete dzePVD dzekamuri uye mhete dzeclamp
  • · Machira ekuisa makamuri nemhete dzekuvhara
  • · Mhete dzekuvharira plasma mumasisitimu e dielectric etch

 

Maitiro Ekugadzira:

Kudzvanya kweIsostatic → green machining → sintering pa1600°C → CNC ID/OD grinding → surface lapping → ultrasonic cleaning → 100% CMM inspection. Ultra-smooth surface finish (Ra ≤0.4 μm) inoderedza particle adhesion.

 

Kudzora Hunhu:

  • · Kutarisa 100% divi (ID, OD, ukobvu, kutsetseka)
  • · Kuongorora madhayi anopinda mukati meganda kuti uone kana paine maburi madiki pamusoro
  • · Kuedzwa kwesimba reDielectric paASTM D149
  • · Hapana kusviba kana maburi anooneka pasi pemaikorosikopu makumi maviri nembiri

 

Zvakanakira kupfuura Mhete dzeSimbi kana dzeQuartz:

  • · Nguva refu yehupenyu kupfuura mhete dzearuminiyamu dziri muplasma yefluorine ine 5–10×
  • · Hapana kusvibiswa kwesimbi mumafirimu matete
  • · Kuramba kweplasma kwakanyanya kupfuura quartz (hapana makomba ekukukurwa kwevhu)
  • · Inochengetedza insulation yemagetsi >10¹⁴ Ω·cm kunyangwe mushure mekushandiswa kwenguva refu

 

Zvimwe Zvinhu — Silicon Nitride (SiN):

Kune zvishandiso zvinoda kusimba kwakanyanya kwekupwanyika (6.2 MPa·m¹/²) uye kuramba kupisa kwakanyanya (expansion coefficient 3.2×10⁻⁶/℃), Si₃N₄ rings dziripo. Zvisinei, alumina inodhura zvishoma kune akawanda maCVD/PVD applications. Ndapota taurai zvamunoda pakutenga zvinhu.

 

Kugadzirisa:

  • · Maburi anoburitswa nepakati, mapurofayiri ane masitepisi, kana maburi anosungirirwa pamadziro ekuisa
  • · Nzvimbo yakaputirwa neY₂O₃ kuti irambe yakasimba muplasma (zvichida)
  • · Kunyora neLaser nhamba yechikamu / kodhi yenzvimbo

 

Cherechedza:Ruzivo rwuri pamusoro apa runonyatsotevera tafura yeAl₂O₃ yakapihwa. Kune maSi₃N₄ rings, tarisa kune datasheet rakasiyana reSi₃N₄ rakapihwa.


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