Mhete yeAlumina Chamber Focus Ring yePlasma Etch & CVD Systems

Mhete yeSt.Cera's chamber focus chinhu chakakosha chinoshandiswa mumidziyo yeplasma etch, CVD, uye PVD semiconductor. Yakagadzirwa kubva ku99.8% high-purity alumina (Al₂O₃), mhete iyi inotenderedza mupendero wewafer kuti ivhare plasma uye iwedzere kugoverwa kweion angular, nokudaro ichivandudza kufanana kwe etch pamusoro pewafer. Chinhu ichi chinopa resistance yeplasma inoshamisa, simba re dielectric rakawanda (15×10⁶ V/m), uye kugadzikana kwekupisa kusvika ku1600°C, zvichiita kuti ive yakavimbika kwenguva refu munzvimbo dzeplasma dzine fluorine- kana chlorine. Precision-ground ID/OD uye flatness (≤10 μm) zvinogonesa nzvimbo chaiyo yewafer edge, kuderedza zvikanganiso zvemupendero uye kugadzirwa kwezvikamu.

Magadzirirwo(zvakavakirwa pa99.8% Al₂O₃):

Mashandisirwo:

• · Mhete dzekutarisa dzekamuri reDielectric etch (oxide, nitride etch)
• · Mhete dzemumucheto wekamuri reSilicon etch
• · Mhete dzekushandisa CVD chamber process kit
• · Mhete dzePVD dzekamuri nedzekusunga

Maitiro Ekugadzira:

Upfu hwealumina hwakachena zvakanyanya hunodzvanywa ne isostatically → hwakagadzirwa muchina wegirini kusvika pachimiro che net-net → hunopiswa pa 1600°C → Kukuya kwedhaimani reCNC reID, OD, uye ukobvu → kukwesha kuti rive rakatsetseka ≤10 μm → kucheneswa ne ultrasonic → 100% CMM inspection. Kupera kwepamusoro Ra ≤0.4 μm kunoderedza kunamira kwezvikamu.

Kudzora Hunhu:

• · Kuongorora kwe100% divi (ID, OD, ukobvu, parallelism)
• · Kuongororwa kwekutsvuka kwedhayi (hakubvumidzwe kutsemuka nedhayi)
• · Kuongorora maziso pasi pemaikorosikopu ye20× — hapana machipisi, maburi, kana kusviba kweruvara
• · Kuedzwa kwesimba reDielectric paASTM D149 (sampuli)

Mabhenefiti anopfuura Silicon kana Quartz Focus Rings:

• · Hupenyu hwese hwe fluorocarbon plasma hurefu ne 5–10×
• · Hapana zvimedu zvinodyiwa zvinogona kusvibisa mawafer
• · Simba guru re dielectric rinodzivirira kutenderera kwesimbi
• · Inochengetedza kutwasuka uye kururama kwehukuru hwemaawa eRF zviuru

Zvimwe Zvinhu — Yttria-Stabilized Zirconia (ZrO2)₂):

Kune mashandisirwo anoda kusimba kwakanyanya kwekutyoka (semuenzaniso, makamuri ane frequency thermal cycling kana mechanical shock), ZrO₂ focus rings (density 6.03 g/cm³, flexural strength 1000 MPa, fracture toughness 5–8 MPa·m¹/²) dziripo. Zvisinei, alumina inopa kushanda kuri nani pamutengo uye ndiyo standard yeindasitiri yekushandiswa kwefocus ring.

Kugadzirisa:

• · Mapurofayiri ematanho, maburi emadziro, kana maburi ekuisira padhirowa remutengi
• · Kuvhara kweY₂O₃ kuti irambe kukanganiswa nekuputika kweplasma (ukobvu hwe20–100 μm)
• · Kumaka nhamba yechikamu, kodhi yezuva, kana zviratidzo zvekuenzanisa uchishandisa laser

Cherechedza:Ruzivo rwese rwunotevera tafura yezvivakwa zveAl₂O₃ yakapihwa. Kuti uwane zvirevo zveZrO₂, tarisa pepa redata rezirconia rakapihwa. Magadzirirwo emhete dzekutarisa anogona kuda kubvumidzwa kwepatenti — vatengi vane basa rekusimbisa kodzero dzezvivakwa zvepfungwa.